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POLY 5000 In-Line Thin Film Thickness Tester
POLY 5000 In-Line Thin Film Thickness Tester
POLY 5000 In-Line Thin Film Thickness Tester
POLY 5000 In-Line Thin Film Thickness Tester adopts industry-leading innovative micro-nano film optical measurement technology, using the principle of optical interference, by analyzing the spectrum formed by the interference of light reflected from the film surface and the light reflected from the interface between the film and the substrate, the thickness and optical constants of various films on the industrial production line can be quickly and continuously monitored. Quickly and accurately measure film thickness, optical constants and other information.
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Uniform light intensity and stable spectrum

POLY 5000 Built-in Thin Film Thickness Measurement Instrument uses a tungsten halogen lamp with an effective spectral range of 320nm~2400nm, emitting a continuous spectrum covering all light bands from ultraviolet to infrared. One machine covers the measurement range of multiple machines to ensure the accuracy of test results.

Millisecond level sampling speed

POLY 5000 is specially designed and developed for photovoltaic application customers. It has a spectral range of 300~1100nm and a light spot of 70μm. It is fully suitable for the testing environment and conditions of the photovoltaic industry. With the spectral fitting method, the film thickness and optical constants are finally obtained through fitting, achieving an ultra-wide measurement range of 20nm~2000nm and ultra-high repeatability accuracy of 0.5nm.

Brand new intelligent operation experience

Smart Poly operating software is fast, smart and easy to use. Characterize materials quickly using an intuitive and user-friendly stand-alone PC program without requiring the user to write any code themselves. Operating software ensures accurate results for extensive electrical characterization of materials.

Poly film thickness online monitoring

100% Poly-si deposition process monitoring to improve product yield

Non-contact, non-destructive measurement, zero fragmentation rate, ensuring production efficiency

Improve the level of automated production on the production line, replace manual offline testing with machine automatic testing, and save labor costs

Fast test speed, single chip test time <0.5s

Film thickness repeatability measurement accuracy: <0.5nm (100 consecutive tests)

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